Modification in Chemical Deposition Method fo...

Modification in Chemical Deposition Method for Preparation of NZF Thin films for Gas Sensor Application

Author Name : Pratap Hasbe*, Datta Pawar

ABSTRACT: The Nickel Zinc Ferrite (NZF) binary thin films have been successfully deposited on glass substrates by modification in chemical deposition method from alkaline bath. In this modification, thin films are obtained by immersing substrate into separately placed cationic and anionic precursors (rinsing between every immersion with distilled water is an option) and dried after every immersion using dryer. NZF thin films ware annealed at 400 ˚C for formation of spinel phase. The films were characterized by X-ray diffraction (XRD),Fourier transform infrared spectroscopy (FTIR), static water contact angle. The X-ray diffraction pattern shows that deposited NZF thin films were oriented along (3 1 1) plane.